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Patent for Sale:Delivery of Fluid Supply for Cleaning of Semiconductor Wafer
Wet clean patent covers vital steps in removing impurities from semiconductor substrate.
The patented invention covers the delivery of fluid to the chamber, and its removal, in order for the wet-clean process to take place within the chamber itself.
Primary Application of the Technology
Cleaning of wafers in the semiconductor manufacturing process.
The seller would like to be granted a license back.